International and domestic semiconductor companies have been making major investments in China. This is the motivation behind to organize this Workshop as a first of its kind in China. IWAPS provides a forum for the experts from industry and research institutions worldwide to present and discuss advanced pattering solutions and related challenges such as material, equipment, process, metrology, computational lithography and design optimization.
The speakers at the workshop are selected by invitation only and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. Presentations are arranged to be comprehensive, covering the current practice, the future trends and the challenges ahead. The workshop is intended to provide a platform for attendees from international and domestic institutions to interact and discuss some common challenges faced by the industry. It will also be an opportunity for people to learn more about the semiconductor R&D and business landscape in China.
The speakers at the workshop are selected by invitation only and represent a broad range of disciplines and covering a wide array of different lithography approaches and requirements. Presentations are arranged to be comprehensive, covering the current practice, the future trends and the challenges ahead. The workshop is intended to provide a platform for attendees from international and domestic institutions to interact and discuss some common challenges faced by the industry. It will also be an opportunity for people to learn more about the semiconductor R&D and business landscape in China.
If you have any questions, feel free to mail to iwaps@ime.ac.cn, or contact 010-82995816.
If you want to be IWAPS sponsor, please contact Deputy Secretary-General of the Organizing Committee Ms. Yajuan Su, 010-82995816.
- Hosted by ICIA
- Hosted by COS
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